The 4th annual Meeting for Advanced Electron Beam Lithography (MAEBL) is returning virtually. MAEBL 2020 is series of 6 meetings that bring together the brightest minds in electron beam lithography throughout North America and around the world on the following dates and times:
Attendees have networked with like minded researchers and scientists and witnessed invited talks from Argonne National Laboratory, the National Institute of Standards and Technology, IBM, Ohio State University, The Pennsylvania State University, the University of Delaware, Brookhaven National Laboratory, Caltech, Yale, the University of Pennsylvania, Sandia National Laboratory and MIT, to name a few.
Topics of discussion include but are not limited to:
Registration helps to defer operational costs of the series. To qualify to attend, you must be an active EBL tool owner/user at a recognized academic, industry, or government lab and must sign up using your institution's e-mail. You must sign-up online in advance. Thank you for your cooperation and understanding.