Meet the Team

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The MAEBL Steering Committee

Kevin Lister, Aimee Price and Gerald Lopez (left to right) are the founding members of MAEBL. They painstakingly coordinate MAEBL from campaigning to programming to sponsorships.

MAEBL History

Today, The Meeting for Advanced Electron Beam Lithography or MAEBL is community of engineers, scientists and students from industry, academia, and government that use electron beam lithography (EBL) to enable cutting edge research and development. Structured talks, lectures and planned discussions in addition to over three hours of networking are built into the meeting. What started as a one day agenda will evolve into a two-day event at our meeting at Caltech in 2020.


The Meeting for Advanced Electron Beam Lithography, formerly Mid-Atlantic Electron Beam Lithography, was conceived in 2016 during the Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) conference in Pittsburgh, PA. MAEBL's mission is to connect active novice to experienced EBL tool owners and users to exchange practical and directly applicable knowledge. As a small and geographically dispersed and vendor segmented community, the meeting provides an intimate space to so its members can openly discuss topics devoid of conference formality and EBL hardware vendors/exhibitors. Having entered its third year, MAEBL continues to help promote this dialogue within the segmented EBL community by holding fast to its tradition in allowing only the end-users of these state-of-the-art systems.


On April 19, 2017, over 60 registered for the first MAEBL to discuss best practices, computational efforts and the state-of-the art techniques for fine feature patterning in electron beam lithography. The 2nd MAEBL was held again at the University of Pennsylvania Singh Center for Nanotechnology on April 23, 2018. Both meetings combined, talks by The Ohio State University, the University of Pennsylvania, The Pennsylvania State University, the University of Delaware, Massachusetts Institute of Technology (MIT), Argonne National Laboratory, Brookhaven National Laboratory, IBM Research and MIT Lincoln Laboratory have been witnessed by the attendees representing Carnegie Mellon University, City University of New York, Columbia University, Cornell University, George Washington University, Georgia Institute of Technology, National Research Council of Canada, North Carolina A&T State University, Northwestern University, Princeton University, University of California San Diego, University of California Santa Barbara, The National Research Council Canada and the University of Washington.


MAEBL recently entered its third year at The Ohio State University on Wednesday, April 3, 2019. New to 2019, we are grateful for the support of our MAEBL Charter Sponsors: JEOL USA, Raith, STS-Elionix, AllResist, LatticeGear and GenISys. 

Entering Our 4th Year at Caltech

In our 4th year, we deeply appreciate the show of support by our future host the California Institute of Technology. Please register for this two-day event that features a Fundamentals Workshop on EBL for those new to the field or eager to learn new perspectives from the collective knowledge in an esoteric field of nanotechnology and nanofabrication. 

Past Programs

MAEBL 2019 Program (pdf)

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Press

MAEBL 2018 at UPenn

MAEBL 2018 at UPenn

The 2nd Annual Meeting for Advanced Electron Beam Lithography (MAEBL) Workshop

MAEBL 2018 - NNCI SHYNE

MAEBL 2018 - NNCI SHYNE

Article from NNCI SHYNE about MAEBL 2018

MAEBL 2019 at OSU

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Ohio State hosts 3rd annual MAEBL workshop for users of e-beam lithography tools